Spectro Arcos targets elemental analysis

Germany-based Spectro Analytical Instruments says its newest Spectro Arcos inductively coupled plasma optical emission spectrometer (ICO-OES) represents “the next generation of industry-leading ICP-OES technology.”

The new device “precisely analyzes the elemental composition of metals, chemicals, petrochemicals and more to deliver the critically accurate measurements that industry and academia can depend on,” the company states.

Enhancements introduced in the new Spectro Arcos are based on customer input coupled with what Spectro calls advances in proven technologies. “Spectro Arcos is known for exceptional optical performance, wavelength coverage, sensitivity and resolution, safeguarding users’ ability to get the right analytical results, performance and productivity,” the firm says.

Features of the model include a new dual side-on interface (DSOI) plasma viewing option designed to eliminate contamination/matrix compatibility issues. If the DSOI is not needed, a standard side-on plasma (SOP) version features a dedicated radial, single side-on interface.

A MultiView plasma viewing option lets users select either high-sensitivity axial plasma observation to excel at trace analysis or high-precision radial plasma observation for high matrix loads and organic solutions. The latter option includes a periscope-free MultiView version that enables operators to literally “turn” Spectro Arcos from true radial view into true axial view, or vice-versa, in 90 seconds.

The model’s complementary metal-oxide-semiconductor CMOS detectors are “equal to or surpass the performance of legacy charge-coupled device (CCD) detectors,” states the company. In terms of high-speed readout, Arcos can completely analyze simpler matrices in as little as 30 seconds, says Spectro.

A no-purge, sealed gas purification technology enables fast startup, no chance of contamination and annual gas consumables savings up to about $3,500 annually, the company says.